由 C Klein 著作 · 被引用 62 次 — This upgrade completes IMS' first generation of multi-beam mask writers, which is called MBMW-101 and is meeting the requirements of the 7nm technology node.
Electron beam mask writers have the photomask placed on a stage that moves within a plane, and write the circuit patterns while continually moving the stage.
DNP Introduces Multi E-Beam Mask Writer to Strengthen Next-generation Semiconductor Photomask Production System by Significant Reduction of Writing Time | DNP ...
由 J Yasuda 著作 · 2023 · 被引用 7 次 — The latest MB mask writing system, MBM-2000PLUS, achieves a high throughput of 8.7 h in a 104 × 130 mm2 writing area for a 150 μC cm−2 resist ...
Die ausgereiften Elektronen-Multistrahl-Maskenschreiber MBMW (= Multi-Beam Mask Writer) bieten neben ihrer Präzision auch eine außergewöhnlich hohe ...
由 H Matsumoto 著作 · 2024 — The multi-beam mask writer MBM-3000 is launched in 2023 for next generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode.
We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development.
由 C Klein 著作 · 被引用 62 次 — This upgrade completes IMS' first generation of multi-beam mask writers, which is called MBMW-101 and is meeting the requirements of the 7nm technology node.
Raster Scan: scan back and forth, blank beam where you don't want to write. – Easy, slow, spot size can be adjusted. – Spot size gives direct trade-off ...
